Solar energy paper index
Plasma double layer development during high power EUV exposure
One-line summary
A solar energy research paper on Plasma double layer development during high power EUV exposure.
Engineering notes
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Chinese explanation / 中文解读
中文解读待补充：本站会优先为光伏效率、钙钛矿太阳能电池、储能技术、太阳能热利用、BIPV、并网技术等高价值论文补充中文说明。
Original abstract
The development of electrostatic plasma double layer (DL) at the boundary of Extreme Ultra Violet (EUV) exposed and un-exposed region in the bulk volume has been confirmed by 3DPIC (Particle-In-Cell) simulations in the context of fast transient high power EUV exposures. It is found that the DL exists only for short time scale during EUV-ON time period (~ 70ns) and disappears soon after EUV is OFF. Such DL fingerprint appears above a certain critical value of EUV beam energy (~ 0.1mJ) and it transforms from weak-to-strong DL with further increase of EUV power.
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