The Plasmonic Influence on the Performance of Laser-Scribed Front-Contact Gold Layer in Ultra-Thin Film SiliconSolar Cell

Engineering notes

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Chinese explanation / 中文解读

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Original abstract

Laser scribing of the front-layer metal contact in thin-film silicon solar cell is one method thatenhances optical absorption through localized surface plasmon resonance (LSPR) induced at the laser-scribedgold nano-grooves. A new approach investigates both the plasmonic effect and increasing the absorption of thegold via laser scribing to improve the cell performance. A 3D ultra- thin film silicon solar cell (dimensions of400 × 400 × 900 nm3 for width, length, and height) was designed, with a 50 nm thick gold front contact scribedat groove depths of 10, 20, 30, and 40 nm (fixed width of 100 nm). COMSOL Multiphysics software version6.2, using the finite element method (FEM), was employed to design and numerically investigate the proposedcell. The results revealed a maximum photocurrent of 24.66 mA/cm2 at a scribed depth of 40 nm. The laserscribednano-grooves excite localized surface plasmon resonances at the gold-silicon interface, enhancingelectromagnetic field confinement and light trapping in the ultra-thin silicon layer. It is concluded that the laserscribing of the front gold contact improves the light absorption, leading to a significant increase in photogenerationrate and photocurrent density due to plasmonic field enhancement.

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